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  • 专利标题:   System used to at least partially alter defect area in layer of graphene, on substrate, comprises chamber to receive layer including some graphene and defect areas in graphene, and container to e.g. react substrate to produce cationic area.
  • 专利号:   US2016009562-A1, US9938151-B2
  • 发明人:   MILLER S A, YAGER T A
  • 专利权人:   EMPIRE TECHNOLOGY DEV LLC
  • 国际专利分类:   B05C003/02, C01B031/04, B05C003/20, B05D005/12, B32B003/10, B32B009/04, C01B032/182, C01B032/184, C01B032/194
  • 专利详细信息:   US2016009562-A1 14 Jan 2016 C01B-031/04 201609 English
  • 申请详细信息:   US2016009562-A1 US657886 13 Mar 2015
  • 优先权号:   WOUS051893, US657886

▎ 摘　　要

NOVELTY - System effective to at least partially alter a defect (108) area in a layer (102) including graphene (106), on a substrate (104), comprises: a chamber (112) to receive a layer including some graphene and at least some defect areas in the graphene, on the substrate placed in the chamber, where the defect areas are effective to reveal exposed areas of the substrate; and a container in communication with the chamber. The chamber and the container are configured to e.g. react the substrate to produce at least one cationic area in at least one of the exposed area. USE - The system is useful for partially altering the defect area in a layer including graphene, on a substrate. ADVANTAGE - The system alters the defects even after graphene has been transferred from a location from where the graphene was grown. DETAILED DESCRIPTION - System effective to at least partially alter a defect (108) area in a layer (102) including graphene (106), on a substrate (104), comprises: a chamber (112) to receive a layer including some graphene and at least some defect areas in the graphene, on the substrate placed in the chamber, where the defect areas are effective to reveal exposed areas of the substrate; and a container in communication with the chamber. The chamber and the container are configured to react the substrate to produce at least one cationic area in at least one of the exposed area; adhere graphene oxide to the at least one cationic area to produce a graphene oxide layer; and reduce the graphene oxide layer to produce at least one altered defect area in the layer. An INDEPENDENT CLAIM is also included for a processed layer comprising: at least some graphene on a substrate; at least one defect area in the graphene, the defect area is effective to reveal a cationic area of the substrate; and a reduced graphene oxide layer adhered to the cationic area. DESCRIPTION OF DRAWING(S) - The figure illustrates the system that can be utilized to implement graphene defect alteration. Layer (102) Substrate (104) Graphene (106) Chamber (108) Defect (112)