• 专利标题:   Source-drain light doping heterogeneous gate graphene nanometer strip field effect tube, has source region provided with source N-type heavily doped region and source extension region, and gate oxide layer located on two sides of graphene nano-tubes.
  • 专利号:   CN209626230-U
  • 发明人:   ZHANG W, QU K, WANG W
  • 专利权人:   UNIV NANJING POST TELECOM
  • 国际专利分类:   H01L029/08, H01L029/78
  • 专利详细信息:   CN209626230-U 12 Nov 2019 H01L-029/78 201989 Pages: 7 Chinese
  • 申请详细信息:   CN209626230-U CN20838966 04 Jun 2019
  • 优先权号:   CN20838966

▎ 摘  要

NOVELTY - The utility model claims a source-drain light doping heterogeneous gate graphene nanometer strip field effect transistor, comprising a source region, a drain region, a channel, a gate oxide layer and double-gate; two end of grid comprises grid and grid middle, two ends of the gate work function and gate work function are different; channel is graphite nanotubes, located between the source region and the drain region, the source region and the drain region both comprise N-type heavily doped region and the extension regions near the graphene nanotubes, N-type heavily doped region are N type lightly doped graphene and nanotubes, source extension regions and drain extension regions; a gate oxide layer located on the two side of the graphene nano -, double-gate on the gate oxide layer. The utility model reduces the device performance degradation, has a greater current switching ratio, delay time is shorter, a sub-threshold swing is smaller, higher voltage gain of source-drain light doping heterogeneous gate graphene nanometer strip field effect tube.