1. 平台首页
  2. 国际专利信息
  • 专利标题:   Patterning component designed to contact with substrate having graphene oxide film used in wirings of damascene structure of semiconductor device, consists of metal layer with pattern formed on patterning component.
  • 专利号:   US2016067680-A1
  • 发明人:   MATSUMOTO T, KASHIWAGI Y
  • 专利权人:   TOKYO ELECTRON LTD
  • 国际专利分类:   B01J023/755, H01L021/768, H01L023/532
  • 专利详细信息:   US2016067680-A1 10 Mar 2016 B01J-023/755 201622 Pages: 14 English
  • 申请详细信息:   US2016067680-A1 US939170 12 Nov 2015
  • 优先权号:   JP004490

▎ 摘　　要

NOVELTY - A patterning component consists of a catalyst metal layer of a pattern formed on a surface of the patterning component making contact with the substrate (S) having graphene oxide film (50). USE - Patterning component used in wirings of damascene structure of semiconductor device. ADVANTAGE - The patterning component increases manufacturing efficiency of semiconductor devices. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the portion of the substrate. Graphene oxide film (50) Wirings (51) Substrate (S)