▎ 摘　　要

NOVELTY - Pre-treatment of a substrate (20) involves using a pre-treatment gas including at least a carbon source (26) and hydrogen. USE - Pre-treatment of substrate e.g. non-metal substrate such as semiconductor substrate or dielectric substrate used for forming graphene (all claimed). ADVANTAGE - The method is carried out with high efficiency, and removes residues and oxides from the surface of the non-catalyst substrate. The pretreatment process increases the k-value of the substrate to a value greater than 2.70 and less than 2.80, and decreases the absorbance of the substrate measured at a wavenumber corresponding to D-band of graphene to 0.26. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for formation of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the graphene formation. Substrate (20) Surface (20A) Graphene seeds (24) Carbon source (26)