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  • 专利标题:   Gas-sensitive material for detecting low concentration of formaldehyde, comprises tin oxide-doped indium oxide and graphene complex material.
  • 专利号:   CN104211108-A, CN104211108-B
  • 发明人:   BAI L, CHU X, YU X, ZHU H, HU R
  • 专利权人:   UNIV ANHUI TECHNOLOGY
  • 国际专利分类:   C01G019/02, G01N027/04
  • 专利详细信息:   CN104211108-A 17 Dec 2014 C01G-019/02 201510 Chinese
  • 申请详细信息:   CN104211108-A CN10478925 18 Sep 2014
  • 优先权号:   CN10478925

▎ 摘　　要

NOVELTY - Gas-sensitive material comprises tin oxide-doped indium oxide and graphene complex material, where the molar ratio of tin oxide to indium oxide is 8-10, and the amount of graphene is 0.08-0.15 wt.% to the amount of tin oxide and indium oxide. USE - The gas-sensitive material is useful for detecting low concentration of formaldehyde (claimed). ADVANTAGE - The gas-sensitive material has a sensitivity of 1.09-1.1 for 0.001 ppm formaldehyde, and 220-240 for 1000 ppm formaldehyde.