• 专利标题:   Preparation of wrinkle-free graphene involves subjecting catalytic substrate to ion injection, forming discrete end injection units at catalytic substrate, and heating catalytic substrate in growth chamber.
  • 专利号:   CN105110324-A, CN105110324-B
  • 发明人:   DI Z, WANG G, XUE Z, ZHANG M, ZHENG X, DAI J, WANG Z
  • 专利权人:   SHANGHAI INST MICROSYSTEM INFORMATION, SHANGHAI INST MICROSYSTEM INFORMATION
  • 国际专利分类:   C01B031/04, C01B032/184
  • 专利详细信息:   CN105110324-A 02 Dec 2015 C01B-031/04 201633 Pages: 9 English
  • 申请详细信息:   CN105110324-A CN10508080 18 Aug 2015
  • 优先权号:   CN10508080

▎ 摘  要

NOVELTY - A surface of a catalytic substrate is subjected to ion injection and catalytic properties of injection area are disrupted. Discrete end injection units are formed at surface of catalytic substrate. The catalytic substrate is provided to growth chamber and heated to predetermined temperature, and carbon source is passed to growth chamber, and discretes are grown to obtain wrinkle-free graphene. USE - Preparation of wrinkle-free graphene (claimed). ADVANTAGE - The method enables preparation of wrinkle-free graphene with high quality, low density, desired shape and excellent device accommodation characteristics.