▎ 摘　　要

NOVELTY - Method of improving quality of graphene on a non-metallic substrate involves growing a graphene film on the non-metallic substrate, depositing a layer of copper with thickness of 500-600 nm on the substrate, performing chemical vapor deposition (CVD) in a reaction chamber, again growing graphene film on the substrate and again performing CVD method, removing copper surface using an oxygen plasma, and etching copper using an ferric chloride solution. USE - Method of improving quality of graphene on a non-metallic substrate (claimed). ADVANTAGE - The method provides improved quality of graphene on the non-metallic substrate with improved performance.