• 专利标题:   Strain measurement sensor used for wearable device to measure biosignal or movement, comprises base layer formed of flexible material, and conductive thin film layer provided on surface of base layer and formed with cracks having at least one pattern of irregular straight lines or irregular curves.
  • 专利号:   WO2023282386-A1, KR2023006966-A
  • 发明人:   KIM H J, RYU C H, KIM H, RYU C
  • 专利权人:   DAEGU GYEONGBUK INST SCI TECHNOLOGY
  • 国际专利分类:   C25D005/00, C30B029/10, C30B007/00, C30B007/12, G01B007/16, G01L001/22, H01B001/12, H01B005/14
  • 专利详细信息:   WO2023282386-A1 12 Jan 2023 G01B-007/16 202310 Pages: 26
  • 申请详细信息:   WO2023282386-A1 WOKR012819 17 Sep 2021
  • 优先权号:   KR087605

▎ 摘  要

NOVELTY - Strain measurement sensor comprises a base layer formed of a flexible material, and a conductive thin film layer provided on one surface of the base layer and formed with cracks having at least one pattern of irregular straight lines or irregular curves. USE - The strain measurement sensor is used for wearable device to measure biosignal or movement. ADVANTAGE - The method shortens manufacturing time compared to the manufacturing process of the conductive thin film layer using a conventional sputtering device, requires no expensive equipment, and reduces manufacturing costs. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing the strain measuring sensor, which involves providing a conductive wire on one side of the substrate, coating one surface of the substrate with a liquid polymer material to form a substrate layer with the conductive wire interposed therebetween, separating the base layer on which the conductive wire is fixed on one side of the substrate from the substrate, growing metal nanoparticles on the conductive wire through an electrochemical deposition process actively using the conductive wire after soaking the substrate layer in a solution containing metal ions, and forming a conductive thin film layer having at least one pattern of cracks among irregular straight lines and irregular curves on the base layer by using the growth of the metal nanoparticles.