• 专利标题:   Graphene-based getter comprises metal substrate and graphene getter layers grown on metal substrate, prepared by annealing metal substrate into tubular furnace, putting carbon source, heating metal substrate and naturally cooling.
  • 专利号:   CN111359584-A
  • 发明人:   WANG F, LU G
  • 专利权人:   HUNAN ERLINGBA ADVANCED TECHNOLOGY CO
  • 国际专利分类:   B01D053/02, B01J020/20, B01J020/30
  • 专利详细信息:   CN111359584-A 03 Jul 2020 B01J-020/20 202066 Pages: 9 Chinese
  • 申请详细信息:   CN111359584-A CN10319646 22 Apr 2020
  • 优先权号:   CN10319646

▎ 摘  要

NOVELTY - A graphene-based getter comprises metal substrate and graphene getter layers grown on metal substrate. USE - Graphene-based getter. ADVANTAGE - The product can effectively resist impact vibration and be mass produced, has large specific surface area, stable performance, simple preparation, low cost, firm growth on metal substrate and strong molecular binding force, and prevents graphene powder from falling. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of the graphene-based getter comprising: (A) uniformly mixing and stirring 85% phosphoric acid and polyethylene glycol at volume ratio of 3:1 as polishing liquid, selecting coarse copper as cathode and metal substrate to be polished as anode, polishing under constant voltage of 1.5-1.8 V, immersing metal substrate in acetone, heating, ultrasonically cleaning, cleaning residual alcohol on metal substrate using acetone, ultrasonically cleaning in alcohol, taking out metal substrate, washing using deionized water, and drying by high purity nitrogen; and (B) annealing metal substrate into tubular furnace under argon gas protection at 1000-1100 degrees C, putting carbon source into tubular furnace, keeping carbon source on metal substrate wind position, introducing argon gas to exhaust air in reaction device, heating metal substrate under argon gas atmosphere to 700-850 degrees C for 1-2 hours, simultaneously heating carbon source using halogen tungsten lamp at 200 degrees C, stopping heating and closing halogen tungsten lamp, naturally cooling reaction system under argon gas protection to room temperature to obtain two-dimensional multi-layer graphene-metal substrate getter.