• 专利标题:   Method for forming tunable bandgap in graphene-based switching device, involves creating bandgap in bi-layer graphene by reducing interlayer spacing between bi-layer graphene.
  • 专利号:   US2011101309-A1, US8105928-B2
  • 发明人:   LIN Y, YAU J
  • 专利权人:   INT BUSINESS MACHINES CORP
  • 国际专利分类:   H01L021/04, H01L029/16, G05F003/02, H01L021/24, H01L029/06
  • 专利详细信息:   US2011101309-A1 05 May 2011 H01L-029/16 201132 Pages: 17 English
  • 申请详细信息:   US2011101309-A1 US612018 04 Nov 2009
  • 优先权号:   US612018

▎ 摘  要

NOVELTY - The method involves subjecting bi-layer graphene to an electric field and simultaneously subjecting bi-layer graphene to an applied strain so that interlayer spacing between the bi-layer graphene is reduced. The applied strain is created by expanding dielectric material having ferroelectric and piezoelectric properties. The bandgap is created in the bi-layer graphene. USE - Method for forming tunable bandgap in graphene based switching device (claimed). ADVANTAGE - The tunable bandgap is produced in the graphene so that high on/off ratio is achieved. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) graphene based switching device; and (2) method for forming graphene based switching device. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of graphene-based switching device. Substrate (100) Bi-layer graphene channel (112) Metal contact (114) Top gate dielectric layer (116) Graphene-based switching device (200)