• 专利标题:   Graphene/polysulfone amide composite film comprises polysulfone as substrate and uniformly dispersed the graphene on the polysulfone amide substrate.
  • 专利号:   CN106519688-A, CN106519688-B
  • 发明人:   XIN B, YU J
  • 专利权人:   UNIV SHANGHAI ENG TECHNOLOGY, UNIV SHANGHAI ENG TECHNOLOGY
  • 国际专利分类:   C08J005/18, C08K003/04, C08L081/10
  • 专利详细信息:   CN106519688-A 22 Mar 2017 C08L-081/10 201738 Pages: 9 Chinese
  • 申请详细信息:   CN106519688-A CN10587017 15 Sep 2015
  • 优先权号:   CN10587017

▎ 摘  要

NOVELTY - Graphene/polysulfone amide composite film comprises polysulfone as substrate and graphene is uniformly dispersed on the polysulfone amide substrate, where the mass ratio of graphene in the composite film is 0.1-1%. USE - Used as graphene/polysulfone amide composite film. ADVANTAGE - The composite film is utilized as two-dimensional honeycomb structure carbon material and in preparation of flexible textiles; has excellent electrical conductivity, good anti-static properties, good resistance to UV, low-dimensional heterogeneous nucleating agent and increased crystallization rate; reduces nucleation barrier; induces the crystallization of the polymer; and combined effect of toughness and process ability of polymers. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing composite film comprising (i) taking graphene and dimethylacetamide (solvent) in a mass ratio of 1:187-1873 and ultrasonic mixing to obtain solvent dispersion of graphene; (ii) adding polysulfonamide spinning solution into the solvent dispersion of the graphene, stirring mechanically and ultrasonic mixing, to obtain graphene/polysulfonamide spinning solution; and (iii) defoaming the graphene/polysulfonamide spinning solution statically, placing soluion uniformly on the substrate of the adhesive tape spin-coated film; and removing the spin-coated composite film in the dimethylacetamide solvent and drying.