• 专利标题:   Graphene FET structure for graphite alkenyl integrated circuit, has bottom layer formed with h-BN medium layer, graphite thin layer and top grate h-BN medium layer, and graphite alkene double-edge connected to source and leakage electrodes.
  • 专利号:   CN104538449-A, CN104538449-B
  • 发明人:   QIU Z
  • 专利权人:   WUXI AIDEFA TECHNOLOGY CO LTD, LIANJIANG WEIJIA IND DESIGN CO LTD
  • 国际专利分类:   H01L021/336, H01L029/78
  • 专利详细信息:   CN104538449-A 22 Apr 2015 H01L-029/78 201545 Pages: 8 Chinese
  • 申请详细信息:   CN104538449-A CN10838015 29 Dec 2014
  • 优先权号:   CN10838015

▎ 摘  要

NOVELTY - The structure has a bottom layer formed with an h-BN medium layer (3), a graphite thin layer (1) and a top grate h-BN medium layer (2). A graphite alkene double-edge is connected to a source electrode (7) and a leakage electrode (8). The h-BN medium layer is formed with a catalytic metal thin film layer (4). USE - Graphene FET structure for a graphite alkenyl integrated circuit. ADVANTAGE - The structure has high finished product rate, and reduces manufacturing difficulty and improves product performance in a graphite alkenyl integrated circuit foundation. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene FET structure manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a graphene FET structure. Graphite thin layer (1) Top grate h-BN medium layer (2) H-BN medium layer (3) Catalytic metal thin film layer (4) Source electrode (7) Leakage electrode (8)