▎ 摘　　要

NOVELTY - The chip has a micro-electrode array performs negative photo resist manufacturing process. A single layer graphene thin film cover is formed with a micro-electrode array that is connected with a third dimension heave. A micro-electrode chip is provided with a periphery gold electrode lead pin. The micro-electrode array is made of silicon chip, quartz or boron silicon glass materials. The silicon chip is formed with a substrate. USE - Three-dimension graphene micro-electrode array chip. ADVANTAGE - The chip is convenient to observe. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a three-dimension graphene micro-electrode array chip manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a three-dimension graphene micro-electrode array chip. '(Drawing includes non-English language text)'