• 专利标题:   Graphene site effect transistor, has insulation layer placed between graphene layer and source leakage electrode layer and formed in active region area, and top gate electrode fixed across source electrode and leakage electrode.
  • 专利号:   CN105140284-A
  • 发明人:   CHU W, DONG F, XU L, YAN L, ZHAO M
  • 专利权人:   NAT CENT NANOSCIENCE TECHNOLOGY CHINA
  • 国际专利分类:   H01L021/28, H01L029/06, H01L029/423, H01L029/66, H01L029/78
  • 专利详细信息:   CN105140284-A 09 Dec 2015 H01L-029/78 201602 Pages: 13 English
  • 申请详细信息:   CN105140284-A CN10452107 28 Jul 2015
  • 优先权号:   CN10452107

▎ 摘  要

NOVELTY - The transistor has a graphene layer placed on a first insulation layer. A source leakage electrode layer is placed on the graphene layer. A second insulation layer is placed between the graphene layer and the source leakage electrode layer. A third insulation layer and the second insulation layer are formed in an active region area. A top gate electrode is fixed across a source electrode and a leakage electrode. An adhesive layer is provided with material that is selected from chromium, titanium and nickel. A conductive layer is made of gold material. USE - Graphene site effect transistor. ADVANTAGE - The transistor increases alignment precision, reduces manufacturing cost and eliminates overlapping process. DETAILED DESCRIPTION - The transistor comprises an insulation material layer provided with material that is selected from aluminum oxide and hafnium oxide. An INDEPENDENT CLAIM is also included for a graphene site effect transistor manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a graphene site effect transistor.