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  • 专利标题:   Reducing graphene oxide involves growing Shigella species up to mid-log exponential phase in suitable culture medium comprising graphene oxide at optimized conditions to obtain reduced graphene oxide as finished product.
  • 专利号:   IN201401604-I3
  • 发明人:   BAHADUR D, PANWAR A S, BANSAL P, DOSHI S N
  • 专利权人:   INDIAN INST TECHNOLOGY BOMBAY
  • 国际专利分类:   C12R001/02, A61L027/54, C01B031/04
  • 专利详细信息:   IN201401604-I3 27 Nov 2015 C12R-001/02 201615 Pages: 32 English
  • 申请详细信息:   IN201401604-I3 INMU01604 09 May 2014
  • 优先权号:   INMU01604

▎ 摘　　要

NOVELTY - Reducing graphene oxide involves growing Shigella species up to mid-log exponential phase in a suitable culture medium comprising graphene oxide at 37 degrees C on a shaker at 150-250 revolutions per minute for 6-10 hours in a dark condition to obtain reduced graphene oxide as the finished product. USE - Method for reducing graphene oxide by microbial action (claimed). ADVANTAGE - The method enables to reduce graphene oxide by microbial action, in a highly efficient manner.