▎ 摘　　要

NOVELTY - Optical nanolithography of two-dimensional materials involves coating a glass, quartz, silicon wafer or sapphire substrate with a photoresist having quantum confinement effect, transferring a layer of two-dimensional material such as graphene, boron nitride, molybdenum disulfide, molybdenum diselenide, tungsten disulfide and tungsten diselenide onto the photoresist, directly and continuously writing a geometric figure with a laser working in continuous or pulsed regime by using a laser diode, and using a network of laser beams which are individually controlled by a spatial light modulator. USE - Optical nanolithography of two-dimensional materials e.g. graphene, boron nitride, molybdenum disulfide, molybdenum diselenide, tungsten disulfide and tungsten diselenide for semiconductors.