▎ 摘　　要

NOVELTY - Method for performing chemical modification of graphene, involves performing photochemical modification of graphene and substrate using pulsed laser direct patterning, and subjecting the photochemical modified graphene and substrate to atomic layer selective deposition. USE - The method is useful for performing chemical modification of graphene which is used in preparation of graphene devices (all claimed). ADVANTAGE - The method performs chemical modification of graphene simply, and enables to prepare graphene device conveniently and simply by reducing general graphene device manufacturing exposure, deposition and etching complex technology.