• 专利标题:   Heterojunction tunnel field-effect transistor for use in field of logic circuit component, where the transistor utilizes silicon dioxide/silicon as bottom gate, and tin sulfide/molybdenum diselenide heterojunction between hexagonal boron nitride and silicon dioxide.
  • 专利号:   CN115632066-A
  • 发明人:   SU S, CHAI Z, CHEN H
  • 专利权人:   UNIV SOUTH CHINA NORMAL
  • 国际专利分类:   H01L021/34, H01L029/267, H01L029/43, H01L029/739
  • 专利详细信息:   CN115632066-A 20 Jan 2023 H01L-029/739 202313 Chinese
  • 申请详细信息:   CN115632066-A CN11232071 10 Oct 2022
  • 优先权号:   CN11232071

▎ 摘  要

NOVELTY - Tin sulfide/molybdenum diselenide heterojunction tunnel field-effect transistor based on double-gate control, where the transistor utilizes graphene nano sheet layer/hexagonal boron nitride nano sheet as top gate, silicon dioxide/silicon as bottom gate, and tin sulfide/molybdenum diselenide heterojunction between hexagonal boron nitride and silicon dioxide, in the heterojunction, tin sulfide/molybdenum diselenide nano sheets are partially overlapped, and the overlapped part is a depleted region. USE - The transistor is useful for logic circuit component. ADVANTAGE - The tunneling field-effect transistor has high carrier mobility and wider application range, and has low bias control and characteristics, using ultra-thin graphene sheet and h-BN nano-sheet, under the condition of ensuring the device light transmission type, the device still has obvious control effect. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing tin sulfide/molybdenum diselenide heterojunction tunnel field-effect transistor based on double-gate control.