• 专利标题:   Method for forming dielectrical layer for manufacturing FET of display, involves arranging insulating layer on graphene layer, and forming substrate between insulating layer and support layer that are adhered to roll part.
  • 专利号:   KR1438581-B1
  • 发明人:   KIM H J, JUNG H, KO K Y
  • 专利权人:   UNIV YONSEI IND ACADEMIC COOP FOUND
  • 国际专利分类:   H01L021/336
  • 专利详细信息:   KR1438581-B1 12 Sep 2014 H01L-021/336 201465 Pages: 18
  • 申请详细信息:   KR1438581-B1 KR119963 08 Oct 2013
  • 优先权号:   KR119963

▎ 摘  要

NOVELTY - The method involves arranging an insulating layer on a grapheme layer and a carbon nano tube layer. A support layer is formed with the grapheme layer and the carbon nano tube layer. A first substrate is provided with the insulating layer that is separated from a second substrate. A sacrificial layer, the insulating layer and the support layer are dipped in a liquid part. The sacrificial layer is provided with a water soluble polymer that is arranged on the first substrate. The second substrate is formed between the insulating layer and the support layer that are adhered to a roll part. USE - Method for forming dielectrical layer for manufacturing FET of display. ADVANTAGE - The method enables degrading a graphene device in convenient manner, forming a thin film layer into a physical transfer system so as to avoid requirement of chemical treatment in a surface substrate. The method enables forming the thin film layer on the substrate so as to reduce stable surface difficulty. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a method for manufacturing a FET (2) a method for manufacturing a display. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart of a method for forming dielectrical layer for manufacturing FET of display.'(Drawing includes non-English language text)'