▎ 摘　　要

NOVELTY - Method for producing a thin film, involves developing a colloidal aqueous solution in which nanosheets are dispersed on the water surface, forming a dense monolayer film of the nanosheets at the gas-liquid interface, and transferring the dense monolayer of nanosheets to a substrate to form a thin film comprising the dense monolayer of nanosheets. USE - The method is used for producing a thin film, which is used in optical thin film, dielectric thin film, conductive thin film (all claimed). ADVANTAGE - The method can shorten the nanosheet manufacturing time compared to conventional manufacturing methods such as dip coating and spin coating, provides dense and large-area coating structure, produces high-quality nanosheet thin film, reduces cost of thin film manufacturing, and is effective as industrial thin film manufacturing method and nano-coating method. The thin film exhibits high electron mobility, flexibility, transparency, high heat resistance, excellent electronic and ionic conductivity, semiconducting properties, insulating properties, high dielectric properties, ferroelectric properties, ferromagnetism, fluorescent properties, and photocatalytic properties. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a thin film having a release agent content of 100 ppm wt or less manufactured by the thin film manufacturing method.