▎ 摘　　要

NOVELTY - The method comprises performing fluorescence quenching microscopy on a graphene sample to identify graphene layers on arbitrary substrates. The fluorescence quenching microscopy comprises applying a polymer mixed with fluorescent dye onto the graphene and then viewing the sample under a fluorescence microscope. The polymer and dye mixture is applied by spin-coating a solution of the polymer and dye mixture onto the graphene sample. The polymer is removed by soaking in acetone. Individual images of the graphene sample are obtained to collect a montage of the images. USE - The method is useful for analyzing a graphene (claimed) for industrial applications such as solar cells, electronic systems on printed circuit boards, semiconductor devices and thermal heat sinks. ADVANTAGE - The method is capable of quickly and easily identifying the layer thickness and uniformity of the entire large-area graphene samples on the arbitrary substrates in an accurate manner without cracks and wrinkles, thus improving quality, performance and electrical, optical and mechanical properties of the graphene. DETAILED DESCRIPTION - The method comprises performing fluorescence quenching microscopy on a graphene sample to identify graphene layers on arbitrary substrates. The fluorescence quenching microscopy comprises applying a polymer mixed with fluorescent dye onto the graphene and then viewing the sample under a fluorescence microscope. The polymer and dye mixture is applied by spin-coating a solution of the polymer and dye mixture onto the graphene sample. The polymer is removed by soaking in acetone and including the initial step, before to the soaking with acetone, of applying a small amount of either acetone or polymethyl methacrylate to the polymer and drying the applied acetone or polymethyl methacrylate. Individual images of the graphene sample are obtained to collect a montage of the images. The graphene layers are identified by performing a histogram-based segmentation based on contrast relative to substrates. The segmentation step comprises collecting a large-scale, high-resolution montage image of the sample and processing the image to remove the effects of non-uniform illumination. The effects of non-uniform illumination is removed by applying the polymer and the dye mixture onto a substrate bare of graphene and creating a correction image using the same imaging pathway used to create the montage image. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a large-area, high-contrast graphene metrology technique.