▎ 摘　　要

NOVELTY - The utility model claims a reaction gas supply device and a CVD method for preparing graphene by CVD method for producing cold wall furnace of graphite alkene, the reaction gas supplying device comprises an air inlet pipe, an air outlet device and a current limiting device; the air inlet pipe is sealing-connected with the air outlet device, the outlet device is hollow box body, the box body surface is provided with multiple air outlet holes, said current limiting device comprises a shell, a first port, a second port and a gas passage, wherein the air outlet device is set on the first port of the current-limiting device. and one surface of which is provided with air outlet hole is matched with the shape of the first port of the current-limiting device, the air flow from the air inlet pipe into the air outlet device, a gas passage and then discharged to the current-limiting device is comprised of the air hole of the air outlet device, gas from the first port to the second port. the cold wall furnace comprises the reaction gas supplying device and the furnace wall. the reaction gas supplying device can make gas uniformly through the graphene growth substrate, realizing batch growth and uniform growth of the graphene.