• 专利标题:   Pellicle used for reticle for extreme-UV exposure, comprises pellicle film through which extreme-UV rays transmit and support frame for supporting pellicle film, where pellicle film comprises multilayer thin film structure.
  • 专利号:   WO2023101330-A1, KR2023082570-A
  • 发明人:   KIM Y H, KIMYONGHWAN
  • 专利权人:   INFOVION INC, INFOVION CO LTD
  • 国际专利分类:   C01B032/184, C30B029/06, C30B030/02, G03F001/62
  • 专利详细信息:   WO2023101330-A1 08 Jun 2023 G03F-001/62 202350 Pages: 41
  • 申请详细信息:   WO2023101330-A1 WOKR018831 25 Nov 2022
  • 优先权号:   KR170077, KR158094

▎ 摘  要

NOVELTY - A pellicle comprises a pellicle film (33) through which extreme-UV (EUV) rays transmit and a support frame for supporting the pellicle film. The pellicle film comprises a multilayer thin film structure in which a micrometer-sized crystalline silicon (c-Si) layer (22) with no grain boundary and a graphene thin film are heterojunctioned. USE - Pellicle used for reticle (claimed) for extreme-UV exposure. ADVANTAGE - The pellicle has high transmittance by c-Si, mechanical strength, EUV transmittance, durability against EUV, and provides thin film having high quality, suppressed defect, and can be easily controlled the thickness, and is simply manufactured. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: manufacture of pellicle, which involves (S1) forming a multilayer film comprising a carbon layer, a metal catalyst layer, and an amorphous silicon layer on a substrate, (S2) irradiating electron beam, heating the surface of amorphous silicon layer, crystallizing the amorphous silicon layer into a c-Si layer, passing carbon of the carbon layer through the metal catalyst layer to form a c-Si, forming a multilayer thin film in which the c-Si layer and a graphene layer (42) are heterojunction is finally performed by simultaneously or sequentially diffusion rising to the interface of the metal catalyst layer and then forming graphene at the interface of the raised carbon, (S3) forming a binder layer (50) on an outer circumferential surface of the multilayer film and also forming a binder layer on an opposing support frame (60) surface, and then bringing the support frame into contact with the binder layer on the outer circumferential surface of the multilayer film to perform diffusion bonding through the binder layer, and (S4) lifting-off the multilayer thin film attached to the frame from the substrate; and a reticle, which comprises a photomask, and the pellicle for protecting the photomask from dust. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the pellicle. 22Crystalline silicon layer 33Pellicle film 42Graphene layer 50Binder layer 60Frame