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  • 专利标题:   Removal of graphene used for patterning monolayer or multilayer graphene film, by irradiation with UV light of specific wavelength in specific environment.
  • 专利号:   CN105719953-A
  • 发明人:   LIU H, WANG W, TAN H, QIN X
  • 专利权人:   WUXI GRAPHENE FILM CO LTD
  • 国际专利分类:   C01B031/04, G03F007/00, H01L021/02, H01L021/027
  • 专利详细信息:   CN105719953-A 29 Jun 2016 H01L-021/02 201663 Pages: 6 Chinese
  • 申请详细信息:   CN105719953-A CN10155520 18 Mar 2016
  • 优先权号:   CN10155520

▎ 摘　　要

NOVELTY - Removal of graphene comprises irradiation with UV light of specific wavelength in specific environment. USE - Method for removing graphene used for patterning monolayer or multilayer graphene film. ADVANTAGE - The method is simple and suitable for large-scale industrial production, has high efficiency and low cost, and achieves high-precision patterned graphene production.