▎ 摘　　要

NOVELTY - System comprises a chamber configured to receive a layer including one or more defects in graphene and a container configured to be in communication with the chamber. The chamber and the container are configured to expose the layer to a gas including hydrogen and at least one of boron, aluminum, gallium, indium and thallium, where the exposure of the layer to the gas at least partially alters the defects in the graphene. USE - The system is useful for partially altering defects in a layer i.e. graphene layer, on a substrate (claimed) i.e. silicon dioxide substrate, where the defects are chemical oxidation defects such as epoxides, carboxylic acid functionalities, alcohols, and/or ketones. ADVANTAGE - The system effectively alters the defects in the graphene without degrading electrical conductivity and chemical inertness or mechanical properties.