• 专利标题:   Ink used to manufacture graphene pattern, includes dispersion solution including solvent, polymer binder dissolved in solution, and graphene sheets dispersed thoroughly in solution, where ink has specified viscosity and surface potential.
  • 专利号:   US2015024122-A1, CN104292984-A, TW201504363-A
  • 发明人:   WU M Y, HSIEH C, CHENG R, PENG C, WU Y, XIE C, ZHENG R
  • 专利权人:   ENERAGE INC, ANJU SCI TECHNOLOGY CO LTD, ENERAGE INC
  • 国际专利分类:   C09D011/00, C09D011/03, C09D011/52, H05K003/12, C09D005/24, H01B001/24, H05K001/09, H05K003/02
  • 专利详细信息:   US2015024122-A1 22 Jan 2015 C09D-011/00 201510 Pages: 6 English
  • 申请详细信息:   US2015024122-A1 US032702 20 Sep 2013
  • 优先权号:   TW125396

▎ 摘  要

NOVELTY - Graphene ink comprises: more than 99 wt.% of a dispersion solution including at least one solvent, where the dispersion solution has a surface tension of 35-55 mJ/m2; 0.01-0.5 wt.% of a polymer binder dissolved in the dispersion solution to form a colloidal solution; and 0.1-5 wt.% of graphene sheets dispersed thoroughly in the colloidal solution. The graphene ink has a viscosity of less than 100 cp and a surface potential of greater than 30 mV or less than -30 mV. USE - The ink is useful for manufacturing graphene pattern (claimed) for circuit board, conductive glass and conductive tape used for electronic devices, preferably electrochemical sensors. ADVANTAGE - The ink possesses excellent electrical and thermal conductivities, and is easy to spray onto the surface of the target product to form the graphene pattern or conductive film by patterning. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacturing graphene pattern, comprising: preparing (S10) the graphene ink including the dispersion solution, the polymer binder and graphene sheets, where the dispersion solution has a surface tension of 35-55 mJ/m2, the polymer binder is dissolved in the dispersion solution to form a colloidal solution, the graphene sheets are dispersed in the colloidal solution with a concentration of greater than 0.1 g/l, and the polymer binder in the colloidal solution is less than 10 wt.%; masking (S20) an insulation substrate by coating a patterned photoresist or providing a patterned mask on the insulation substrate; spraying (S30) the graphene ink onto the insulation substrate such that a surface region of the insulation substrate not masked by the patterned photoresist or the patterned mask is covered with the graphene ink; solidifying (S40) the graphene ink by heating and evaporating volatile matters contained in the graphene ink with heat; and removing (S50) the patterned photoresist or the patterned mask by a mechanical means to leave the solidified graphene ink as a graphene pattern on the insulation substrate. DESCRIPTION OF DRAWING(S) - The figure shows a flowchart of a method for manufacturing graphene pattern. Preparing graphene ink (S10) Masking (S20) Spraying graphene ink (S30) Solidifying (S40) Removing mask. (S50)