▎ 摘　　要

NOVELTY - Production process of ultra-clean high-purity acetone, involves (i) mixing industrial acetone and hydrazine aqueous solution, adjusting the temperature to 100-105degrees Celsius, heat-preserving and stirring for 2-3 hours to obtain a reaction liquid, forming the reaction solution and water into a low-boiling azeotrope under atmospheric pressure, and performing primary rectification separation to obtain the reaction to generate acetone azine, (ii) hydrolyzing acetone azine under atmospheric pressure to obtain acetone and hydrazine hydrate, and performing secondary rectification separation to obtain preliminary acetone, and (iii) subjecting the preliminary acetone to adsorption dehydration treatment to obtain high-purity acetone, where the dehydration treatment adopts graphene composite molecular sieve for adsorption dehydration treatment. USE - The process is useful for producing ultra-clean high-purity acetone. ADVANTAGE - The process greatly increases the acetone content of the obtained high-purity acetone compared with the acetone content in industrial acetone, and increases the purity of the obtained high-purity acetone.