▎ 摘　　要

NOVELTY - Forming a film on a substrate (105), comprises: placing the substrate into a reactor (100); placing a solid carbon source (110) into the reactor; and heating both the substrate and the solid carbon source in the reactor, where the film comprises graphene. USE - The method is useful for forming a film on a substrate, where the film comprises graphene (all claimed), which is useful in graphene based electronic devices. ADVANTAGE - The method forms a film with a high quality and large area. DESCRIPTION OF DRAWING(S) - The figure shows a side sectional view of the chemical vapor deposition reactor. Chemical vapor deposition reactor (100) Substrate (105) Solid carbon source (110) Cylindrical reaction tube (115) First support end (120)