• 专利标题:   Device of lithographic apparatus for measuring contamination e.g. carbon based contamination, has layer of non-conducting material, layer of semi-metal that is arranged on layer of non-conducting material and electrode.
  • 专利号:   RD698024-A
  • 发明人:  
  • 专利权人:   ANONYMOUS
  • 国际专利分类:   H01L000/00
  • 专利详细信息:   RD698024-A 10 May 2022 H01L-000/00 202252 Pages: 23 English
  • 申请详细信息:   RD698024-A RD698024 10 May 2022
  • 优先权号:   RD698024

▎ 摘  要

NOVELTY - The device has a layer of a non-conducting material and a layer of a semi-metal that is arranged on the layer of the non-conducting material. An electrode is in electrical contact to the layer of the semi-metal. An electrical source of a voltage or current is connected to two electrodes. The semi-metal is graphene. The non-conducting material is hexagonal boron nitride. (Incomplete specification, abstract based on available information published by the patent office). USE - Device of lithographic apparatus for measuring contamination such as carbon based contamination. ADVANTAGE - The cost time is reduced. The availability of the device is increased. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for measuring contamination. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the device of lithographic apparatus for measuring contamination. Laser system (1) Laser beam (2) Fuel emitter (3) Plasma formation region (4) Near-normal incidence radiation collector (5)