▎ 摘　　要

NOVELTY - Coated cathode material comprises a lithium battery cathode material comprising a lithium transition metal oxide, a first sub-nanoscale lithium metal oxide coating on the lithium battery cathode material, and a second sub-nanoscale metal oxide coating disposed on the first sub-nanoscale lithium metal oxide coating, where the first sub-nanoscale lithium metal oxide and the second sub-nanoscale metal oxide coating are each less than 1 nm thick. USE - Coated cathode material (all claimed), for lithium-ion and solid-state lithium batteries. ADVANTAGE - The material has improved cycle performance, extended the lifetime of the energy storage, and improved interfacial ionic conductivity. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for: 1. a method for forming one or more coated cathode materials for a lithium battery, which involves: a. providing a lithium battery cathode material; b. coating the lithium battery cathode material with a first sub-nanoscale lithium metal oxide coating; c. coating the lithium battery cathode material with a second sub-nanoscale metal oxide coating on top of the first sub-nanoscale lithium metal oxide coating, where the first sub-nanoscale lithium metal oxide and the second sub-nanoscale metal oxide coating are each less than 1 nm thick; and 2. a method for an atomic layer deposition on a lithium battery cathode material, which involves: a. providing a ball-milling mechanism, the ball-milling mechanism comprises a rotating reactor with a plurality of balls, where the multiple balls comprise one or more zirconium dioxide, titanium dioxide, stainless steel, and aluminum oxide c. performing the atomic layer deposition at a deposition temperature between 20-400 °C; d. providing one or more metal precursors, wherein the metal precursors comprise one or more of aluminum, titanium, cobalt, nickel, copper, silicon, germanium, selenium, zirconium, niobium, tungsten, tin, gallium, lithium, magnesium, strontium, barium, iron, hafnium, ruthenium, tantalum, vanadium, and yttrium, where the atomic layer deposition is performed at a pulse (dose) time for a metal precursor between 0.05-60 second to fill the reactor full. The atomic layer deposition is performed with one or more pulses (doses) of the same or different metal precursors to form different metal elements on the same layer, where the atomic layer deposition is performed at an exposure time between 1-3600 seconds until saturation. The atomic layer deposition is performed for a purge time until it reaches an appropriate vacuum state. The atomic layer deposition is performed with water and/or ozone to attach oxygen to the metal precursor surface. The atomic layer deposition is performed for one or more cycles, and the metal oxide coating has a thickness of less than 1 nm.