• 专利标题:   Method for cutting graphene in boundary selectivity way, involves providing heterojunction with boundary, where bandwidth of graphene, width of heterojunction and size of quantum point are in nanometer level.
  • 专利号:   CN102020240-A, CN102020240-B
  • 发明人:   CHENG H, WU Z, GAO L, REN W, LIU B
  • 专利权人:   CHINESE ACAD SCI METAL RES INST
  • 国际专利分类:   B82B003/00
  • 专利详细信息:   CN102020240-A 20 Apr 2011 B82B-003/00 201141 Pages: 12 Chinese
  • 申请详细信息:   CN102020240-A CN10187299 09 Sep 2009
  • 优先权号:   CN10187299

▎ 摘  要

NOVELTY - The method involves providing silicon nanometer particles and boundaries of graphene with different boundary orientation. The boundaries of the graphene are selectively cut by hydrogenation reaction of the graphene under a resistant catalytic reaction of the nanometer particles. A product is obtained by cutting the graphene that is a graphene nanometer band. A heterojunction or a quantum point is provided with regular shape and normal boundary. Bandwidth of the graphene, width of the heterojunction and size of the quantum point are in a nanometer level. USE - Method for cutting graphene in boundary selectivity way. DESCRIPTION OF DRAWING(S) - The drawing shows a graphical representation of a method for cutting graphene in boundary selectivity way. '(Drawing includes non-English language text)'