• 专利标题:   Graphene manufacturing device has base material that is dipped in miscible fluid of etchant and from which metal substrate is removed by metal substrate removing unit and graphene layer is removed.
  • 专利号:   KR1648832-B1
  • 发明人:   KWON Y D, KIM K S
  • 专利权人:   HANWHA TECHWIN CO LTD
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   KR1648832-B1 17 Aug 2016 201670 Pages: 11
  • 申请详细信息:   KR1648832-B1 KR041649 25 Mar 2015
  • 优先权号:   KR041649

▎ 摘  要

NOVELTY - The device (100) has degassing unit (140) which is connected to metal substrate removing unit (130). The base material is dipped in the miscible fluid of the second etchant and from which metal substrate is removed by metal substrate removing unit and first graphene layer is removed. The metal substrate is dipped in the base material from which the second graphene layer is removed in the first etchant. The water unit (120) sprays water on the base material in which the second graphene layer is successively laminated. USE - Graphene manufacturing device. ADVANTAGE - The damage of the graphene layer is minimized. The usability of the graphene manufacturing device is improved. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the graphene manufacturing device. Graphene manufacturing device (100) Water unit (120) Metal substrate removing unit (130) Degassing unit (140) Cooling unit (162)