• 专利标题:   Preparing hollow structure nano tungsten oxide by in-situ growth of graphene oxide involves weighing certain amount of oxidized graphene and tungsten-containing precursor compound, mixing graphene oxide and adding absolute ethyl alcohol.
  • 专利号:   CN107364892-A
  • 发明人:   CUI Y, GAO J, GUO M, TANG Z, TIAN H, WANG C, ZHANG H, ZHOU Z
  • 专利权人:   AECC BEIJING AERONAUTICAL MATERIALS INST
  • 国际专利分类:   B01D053/02, B82Y040/00, C01G041/02
  • 专利详细信息:   CN107364892-A 21 Nov 2017 C01G-041/02 201801 Pages: 10 Chinese
  • 申请详细信息:   CN107364892-A CN10507325 28 Jun 2017
  • 优先权号:   CN10507325

▎ 摘  要

NOVELTY - Preparing hollow structure nano tungsten oxide by in-situ growth of graphene oxide involves weighing certain amount of oxidized graphene and tungsten-containing precursor compound to obtain mixture. The graphene oxide is mixed, followed by the addition of little amount of absolute ethyl alcohol which is modified and dispersed in cdeionized water to obtain oxidized graphene aqueous solution. The tungsten-containing precursor compound is dissolved and graphene oxide aqueous solution are mixed and stirred to obtain oxidized graphene and tungsten containing precursor compound aqueous solution. USE - Method for preparing hollow structure nano tungsten oxide by in-situ growth of graphene oxide (claimed). ADVANTAGE - The method enbales to prepare hollow structure nano tungsten oxide by in-situ growth of graphene oxide energy consumption in cost effective manner which is convenient to realize industrialisation batch production and consumes low energy. DETAILED DESCRIPTION - Preparing hollow structure nano tungsten oxide by in-situ growth of graphene oxide involves weighing certain amount of oxidized graphene and tungsten-containing precursor compound to obtain mixture. The graphene oxide is mixed, followed by the addition of little amount of absolute ethyl alcohol which is modified and dispersed in certain amount of deionized water to obtain oxidized graphene aqueous solution. The tungsten-containing precursor compound is dissolved and graphene oxide aqueous solution are mixed and stirred to obtain oxidized graphene and tungsten containing precursor compound aqueous solution. The oxidized graphene and tungsten-containing precursor compound solution are added and mixed with alcohol. The mixture is filtered to obtain graphene oxide and tungsten-containing precursor compound powder which is placed in an oven at certain temperature to obtain dry mixed powder. The dry mixed powder is added in the alumina crucible which is placed in a tubular reducing furnace whichis palced under vacuum and certain amount of hydrogen gas is introduced and naturally cooled to room temperature to obtain desired product.