▎ 摘　　要

NOVELTY - The apparatus (1) comprises an incident laser beam (11) that is irradiated to two dimensional thin film atomic structure of the lamination number strangeness supported by the insulating material. The microscopic raman spectroscopy meter (2) performs the measurement to acquire the spectroscopy peak intensity ratio of the raman scattered light. The incident laser beam irradiates to two dimensional thin film atomic structure of lamination number supported by the insulating material. A standard curve shows a relationship with the lamination number of two-dimensional thin film atomic structure. USE - Apparatus for determining the lamination number of a graphene. ADVANTAGE - The incident laser beam irradiates to two dimensional thin film atomic structure of lamination number supported by the insulating material, and thus enables to simply and correctly determine the lamination number of a graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method of determining the lamination number of an unknown two-dimensional thin film atomic structure. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a lamination number determining apparatus. Lamination number determining apparatus (1) Microscopic raman spectroscopy meter (2) Laser light source (10) Incident laser beam (11) Spectrometer (16)