• 专利标题:   Preparing photoresist-graphene quantum dot light emitting composite system comprises e.g. providing mixture containing graphene quantum dot and photoresist, exposing the mixture using mask pattern and removing uncrosslinked part.
  • 专利号:   CN107446577-A
  • 发明人:   ZOU Y, XUE B
  • 专利权人:   UNIV BEIJING NORMAL
  • 国际专利分类:   C09K011/02, C09K011/65, G03F007/004, G03F007/027
  • 专利详细信息:   CN107446577-A 08 Dec 2017 C09K-011/65 201811 Pages: 19 Chinese
  • 申请详细信息:   CN107446577-A CN10594613 20 Jul 2017
  • 优先权号:   CN10594613

▎ 摘  要

NOVELTY - Preparing photoresist-graphene quantum dot light emitting composite system comprises (i) providing mixture containing graphene quantum dot and photoresist, (ii) exposing the mixture obtained in step (i) using mask pattern, and (iii) removing uncrosslinked part present in exposed material obtained in step (ii) using developing solution to obtain final product. USE - The composite system is useful in photoelectric detector, display applications, biological imaging, biosensing and drug transport (claimed). DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for photoresist-graphene quantum dot light emitting composite system is prepared by above mentioned method.