▎ 摘　　要

NOVELTY - Producing a patterned graphene comprises: irradiating at least one focal point on a surface of a metal substrate (140) with a laser beam in the presence of carbon dioxide (130), where the laser beam is generated by an ultra-short pulse laser (110) and moving the laser beam relative to the surface of the metal substrate such that the focal point is displaced along a pattern on the surface to produce the patterned graphene. USE - The method is useful for producing a patterned graphene. ADVANTAGE - The method: is simple and rapid to produce graphene and to achieve conversion and in situ immobilization of carbon dioxide to form the graphene; is used for large-scale, industrial production of designable, patterned graphene; and avoids the problems associated with separate forming of graphene followed by patterns on the graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an apparatus (100) for producing a patterned graphene, comprising the ultra-short pulse laser configured to produce a laser beam and a housing (150) configured to accommodate a metal substrate and carbon dioxide, where the housing comprises an optical port configured to allow irradiation of focal point on a surface of the metal substrate by the laser beam. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of the apparatus for producing a patterned graphene. Apparatus (100) Ultra-short pulse laser (110) Carbon dioxide (130) Metal substrate (140) Housing (150)