▎ 摘　　要

NOVELTY - The apparatus has a plasma nozzle (19) that is coupled to a reaction chamber (7). A supply unit (14) is provided for supplying a process gas to the plasma nozzle. A unit (1) for supplying radio frequency radiation to the process gas within the plasma nozzle is provided. The plasma nozzle is arranged such that an afterglow of the plasma extends into the reaction chamber. The cracked carbon-containing species are passed into the reaction chamber, and the cracked carbon-containing species are recombined within the afterglow, so as to form graphitic products including graphene. USE - Apparatus for plasma synthesis of graphitic products including graphene. ADVANTAGE - The graphitic products including graphene is produced efficiently in substrate free manner on large scale. The scalability and elemental purity are improved, the process cost is reduced, and the number of steps in manufacturing process is reduced. DETAILED DESCRIPTION - The process gas is comprised of carbon-containing species. The plasma nozzle is shaped and configured so as to cause each vortex to be formed in the process gas within the plasma nozzle in use, while each vortex being subjected to radio frequency radiation. The plasma nozzle is provided with inlets to receive a stream of the process gas. The inlet is provided with open end communicated with a reaction chamber, and vortex-reflecting end. The nozzle is internally tapered towards the open end. A supply unit for supplying radio frequency radiation is provided with microwave generator, and waveguide arranged to direct the radiation to the nozzle in use and to direct the radiation to the vortex of the process gas in use. The reaction chamber is cylindrical shaped with curved side walls and opening. The surface area of the reaction chamber is configured so as to cause cooling of the afterglow on exiting the nozzle. The plasma is generated at substantially atmospheric pressure. The carbon-containing species is selected from a group consisting of methane, ethane, ethylene, propadienyl, and butane. A buffer gas such as argon, nitrogen and helium is provided as process gas. The ratio of carbon-containing species to buffer gas in the process gas is measured as specific value or less. The buffer gas is made of carbon dioxide. The operating temperature of the afterglow within the reaction chamber is measured as specific value or less several plasma nozzles are coupled to the reaction chamber. A unit for delivering gas around the interface between each nozzle and reaction chamber is provided. The gas is directed towards the nozzle exit along the wall of the nozzle/reaction chamber interface. The gas is directed toward the void of the reaction chamber from the nozzle along the walls of the nozzle or reaction chamber interface. A unit for removing graphitic product from the walls of the reaction chamber is provided. A gas filtration system is coupled to the reaction chamber. The gas filtration system is attached above the reaction chamber. The gas filtration system is provided with an elongate chamber comprising filter candles. The gas filtration system is provided with a unit for blowing gas through the elongate chamber, to dislodge graphitic product from the filter candles. A bag filter is provided to collect the graphitic products. An INDEPENDENT CLAIM is included for a method for plasma synthesizing graphitic products including graphene, which involves extracting the graphitic product using continuous extraction process. The carbon-containing species is cracked without the process gas being introduced into a thermal zone. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the apparatus for plasma synthesis of graphitic products including graphene. Radio frequency supplying unit (1) Dielectric tube (2) Reaction chamber (7) Process gas supplying unit (14) Plasma nozzle (19)