• 专利标题:   Graphene switching device comprises first electrode and insulating layer in semiconductor substrate forming energy barrier between graphene layer and electrode, metal particles, second electrode, gate insulating layer and gate electrode.
  • 专利号:   US2013277644-A1, JP2013222972-A, KR2013117300-A, US8742400-B2, JP6128927-B2, KR1906972-B1
  • 发明人:   SEO D, KIM S, PARK S, YUN Y, LEE Y Y, LEE C, DAVID S, KIM S W, PARK S J, YUN Y J, LEE Y H
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD
  • 国际专利分类:   H01L029/775, H01L021/336, H01L029/06, H01L029/66, H01L029/78, H01L029/786, H01L029/80, H01L051/05, H01L051/30
  • 专利详细信息:   US2013277644-A1 24 Oct 2013 H01L-029/775 201372 Pages: 13 English
  • 申请详细信息:   US2013277644-A1 US861726 12 Apr 2013
  • 优先权号:   KR040415

▎ 摘  要

NOVELTY - Graphene switching device (100) comprises: a first electrode (121) and an insulating layer (140) in first and second regions, respectively of a semiconductor substrate (110); many metal particles; a graphene layer on the metal particles; a second electrode (122) on the graphene layer in the second region, configured to face the insulating layer; a gate insulating layer configured to cover the graphene layer; and a gate electrode on the gate insulating layer. The semiconductor substrate forms an energy barrier between the graphene layer and the first electrode. USE - Used as graphene switching device. ADVANTAGE - The graphene switching device: has a channel width that is not restricted like in a graphene nanoribbon, and thus, graphene defect in a graphene patterning process may be prevented or reduced; and requires reduced operating current by forming metal particles between the semiconductor barrier and the graphene layer, thus reducing a driving power of the graphene switching device. DETAILED DESCRIPTION - Graphene switching device (100) comprises: a first electrode (121) in a first region of a semiconductor substrate (110) and an insulating layer (140) in a second region of the semiconductor substrate; many metal particles on a surface of the semiconductor substrate between the first and second regions; a graphene layer on the metal particles and extending on the insulating layer; a second electrode (122) on the graphene layer in the second region, configured to face the insulating layer; a gate insulating layer configured to cover the graphene layer; and a gate electrode on the gate insulating layer. The semiconductor substrate forms an energy barrier between the graphene layer and the first electrode. DESCRIPTION OF DRAWING(S) - The figure shows a schematic cross-sectional view of a graphene switching device having a tunable barrier. Graphene switching device (100) Semiconductor substrate (110) First electrode (121) Second electrode (122) Insulating layer (140)