• 专利标题:   Preparing graphene film by preparing graphene oxide dispersion, placing on substrate to prepare graphene oxide dispersion film, freeze-drying to prepare graphene oxide film and irradiating graphene oxide film with laser.
  • 专利号:   CN110723725-A
  • 发明人:   ZHANG Y, WANG W, FENG W, LIN S, LIU Y, LI X, CHEN S, CHEN Y, LIN J, ZHANG X
  • 专利权人:   FUJIAN MATERIAL STRUCTURE INST
  • 国际专利分类:   C01B032/184, C01B032/198
  • 专利详细信息:   CN110723725-A 24 Jan 2020 C01B-032/184 202016 Pages: 11 Chinese
  • 申请详细信息:   CN110723725-A CN11067314 04 Nov 2019
  • 优先权号:   CN11067314

▎ 摘  要

NOVELTY - Method for preparing graphene film involves (i) preparing a graphene oxide dispersion, (ii) placing the graphene oxide dispersion on a substrate to prepare a graphene oxide dispersion film, (iii) freeze-drying the dispersion film to prepare a graphene oxide film and (iv) irradiating the graphene oxide film with a laser. USE - The method is useful for preparing graphene film. ADVANTAGE - The method reduces laser power greatly, can use a low-power laser with a power as low as 1 mW, adopts one-step forming of reduced graphene and simple process, is cost-effective, environmentally-friendly and suitable for large-scale production and provides the graphene film with an internal structure which is three-dimensional and porous and has high specific surface area. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the graphene film prepared by the above method.