• 专利标题:   Growth method of aluminum nitride thin film for LED device, involves depositing graphene thin film on surface of glass substrate, and directly depositing aluminum-nitride thin film at high temperature on substrate.
  • 专利号:   CN105731825-A, CN105731825-B
  • 发明人:   CHEN Z, LI J, LIU Z, ZENG Q, ZHANG Y, WEI T
  • 专利权人:   UNIV PEKING, UNIV PEKING
  • 国际专利分类:   C03C017/34
  • 专利详细信息:   CN105731825-A 06 Jul 2016 C03C-017/34 201659 Pages: 6 Chinese
  • 申请详细信息:   CN105731825-A CN10124592 04 Mar 2016
  • 优先权号:   CN10124592

▎ 摘  要

NOVELTY - Growth method of aluminum nitride thin film, involves depositing a graphene thin film on the surface of a glass substrate, and directly depositing an aluminum-nitride thin film at high temperature on the substrate. USE - Growth method of aluminum nitride thin film for LED device. ADVANTAGE - The method enables economical growth of aluminum nitride thin film of large area, at low temperature. The film has excellent thermal conductivity and prevents overheating of LED chips.