▎ 摘　　要

NOVELTY - The method involves preparing a wafer based on silicone. A side of the wafer is formed in a first passivation layer. A graphene layer is arranged on the first passivation layer. A graphene pattern is formed on the graphene layer. Sulfur dioxide molybdenum is printed on the graphene pattern. A side of the sulfur dioxide molybdenum is formed on a second passivation layer. A wafer separating process is performed to manufacture a tactile sensor. The graphene layer is layered with a chemical vapor deposition (CVD) process. First and second graphene electrodes (110) are formed in the graphene layer. USE - Method for manufacturing a tactile sensor (claimed). ADVANTAGE - The method enables improving sensitivity about intensity measurement of power so as to ensure better semiconductor chip characteristic and contact feature, so that activeness element drive circuit switching speed can be improves through large scale integration process, thus improving availability of an artificial skin and combining tactile interface application with a display in an effective manner. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a tactile sensor. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a tactile sensor. ' Strain gauge device (100) Graphene electrode (110) Strain gauge (150)