▎ 摘　　要

NOVELTY - Manufacturing nano pore filter comprises forming a crystal defect including nanopores (101) and functional groups of a target density by subjecting a two-dimensional material (10) to physical etching process, and utilizing chemical etching process to further etch the formed crystal defects with sub-nanometer precision to form nanopores of a target size. USE - The method is useful for manufacturing nano pore filter. ADVANTAGE - The method: controls both nanopore density and size by performing etching process; is economical; and has high productivity. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for nano pore filter. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the manufacturing process of the nano-pore filter (Drawing includes non-English language text). Two-dimensional material (10) Nanopore (101)