• 专利标题:   Frontal structure, has graphene coating film formed in order to surround copper wire with rapidity thermal chemical vapor deposition process, where copper wire is extended to one-way direction.
  • 专利号:   WO2017204408-A1, KR2017132450-A, US2018190406-A1, CN109074892-A
  • 发明人:   WON D K, LIM H T, RYU J C, YUAN D, LIM H, RYU J
  • 专利权人:   HAESUNG DS CO LTD
  • 国际专利分类:   H01B001/02, H01B001/04, H01B013/00, H01B007/00, H01B009/00, C23C016/26
  • 专利详细信息:   WO2017204408-A1 30 Nov 2017 H01B-001/04 201781 Pages: 21
  • 申请详细信息:   WO2017204408-A1 WOKR008495 02 Aug 2016
  • 优先权号:   KR063295, CN80084950

▎ 摘  要

NOVELTY - The structure has a graphene coating film (300) formed in order to surround a copper wire (200b) with a rapidity thermal chemical vapor deposition (CVD) process. The copper wire is extended to one-way direction. A metal is plated on a surface of the copper wire. The metal is selected from one among gold, silver, nickel and rhodium, where gas including carbon i.e. methane gas, is injected among the rapidity thermal CVD process. USE - Frontal structure. ADVANTAGE - The graphene coating film is formed in order to surround the copper wire with the rapidity thermal CVD process so as to improve conductivity of the structure and reduce generation of noise. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a frontal structure manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of a frontal structure. Copper wire (200b) Graphene coating film (300)