▎ 摘　　要

NOVELTY - Process for instantiating elemental metal within ultramicro pore of nanoporous carbon powder composition involves initiating gas flow in reactor assembly (RA) comprising gas inlet and one or more gas outlets, reactor chamber containing nanoporous carbon powder, first porous frit defining floor of reactor chamber, second porous frit defining ceiling of reactor chamber, where each porous frit has porosity which is sufficient to allow gas to permeate into reactor chamber and contain carbon powder, reactor head space, RA coils surrounding reactor chamber and/or reactor head space operably connected to one or more RA frequency generators and one or more power supplies, pair of RA lamps, where pairs of RA lamps are disposed circumferentially around RA coils and define a space between pairs of RA lamps and RA coils, X-ray source (424) configured to expose the reactor chamber to X-rays, one or more lasers configured to direct a laser towards the reactor chamber and a computer processing unit. USE - Process for instantiating elemental metal within ultramicro pore of nanoporous carbon powder composition. ADVANTAGE - The gas processing section controls gas composition and flow rate, with optional embedding of electromagnetic (e.g. light) information or electromagnetic gas pre-treatment to the reactor. DETAILED DESCRIPTION - Process for instantiating elemental metal within an ultramicro pore of a nanoporous carbon powder composition involves initiating a gas flow in RA comprising a gas inlet and one or more gas outlets, a reactor chamber containing a nanoporous carbon powder, a first porous frit defining a floor of the reactor chamber, a second porous frit defining ceiling of the reactor chamber, where each porous frit has porosity which is sufficient to allow a gas to permeate into the reactor chamber and contain carbon powder, a reactor head space disposed above a reactor cap, 2, 3, 4, 5 or more RA coils surrounding the reactor chamber and/or reactor head space operably connected to one or more RA frequency generators and one or more power supplies, 2, 3, 4, 5 or more pairs of RA lamps, where pairs of RA lamps are disposed circumferentially around RA coils and define a space between pairs of RA lamps and RA coils, an X-ray source configured to expose the reactor chamber to X-rays, one or more lasers configured to direct a laser towards the reactor chamber and a computer processing unit configured to control the power supply, frequency generator, X-ray source and one or more lasers, an electromagnetic embedding apparatus located upstream of the gas inlet comprising one or more gas supplies, a housing (415) having a housing inlet and housing outlet, an upstream gas line which is in fluid connection with each gas supply and the housing inlet, an internal gas line in fluid connection with the housing inlet and housing outlet, a downstream gas line in fluid connection with the housing outlet and the gas inlet, at least 5 electromagnetic embedding enclosure (E/MEE) pencil lamps located along the internal gas line, where each E/MEE pencil lamp is placed such that its longitudinal axis is parallel to internal gas line, disposed radially in a vertical plane to the internal gas line or perpendicular to the plane created along the longitudinal axis of the internal gas line or along the vertical axis of the internal gas line, each E/MEE pencil lamp is independently affixed to one or more pivots which permit rotation between about 0 and 360° with respect to x, y and/or z axis, where the x-axis is defined as axis parallel to the gas line and its vertical plane, y-axis defining the axis perpendicular to the gas line and parallel to its horizontal plane and z-axis is defined as the axis perpendicular to the gas line and parallel to its vertical plane, and at least one E/MEE pencil lamp positioned below the internal gas line, at least one E/MEE pencil lamp positioned above the internal gas line and at least one E/MEE pencil lamp positioned to the side of the internal gas line, an optional short wave lamp and/or a long wave lamp, and an optional E/MEE coil wrapped around the internal gas line, where each E/MEE pencil lamp is rotatably mounted, located along length of the internal gas line and powered by the power supply, and the computer processing unit independently controls powering each E/MEE pencil lamp and a rotation position of each E/MEE pencil lamp, independently powering each E/MEE pencil lamp, powering a short wave lamp and a long wave lamp, if present, powering an E/MEE coil wrapped around the internal gas line, if present, independently powering each RA coil to a first electromagnetic energy level, powering one or more RA frequency generators and applying a frequency to each RA coil, independently powering each RA lamp, independently powering each laser, powering X-ray source, independently rotating one or more E/MEE pencil lamps and subjecting nanoporous carbon powder to harmonic electromagnetic resonance in ultramicropores of the nanoporous carbon powder to instantiate an elemental metal nanostructure in a nanopore. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the reactor assembly components. 415Housing 424X-ray source 426Light sources 427Light sources 428Filter