• 专利标题:   Graphene material preparation system comprises e.g. device support provided with glue releasing mechanism and connected with pressing mechanism and graphite mechanism, extrusion mechanism located at upper end of graphite mechanism.
  • 专利号:   CN111302330-A
  • 发明人:   CHEN D
  • 专利权人:   CHEN D
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN111302330-A 19 Jun 2020 C01B-032/184 202054 Pages: 17 Chinese
  • 申请详细信息:   CN111302330-A CN10279778 10 Apr 2020
  • 优先权号:   CN10279778

▎ 摘  要

NOVELTY - Graphene material preparation system comprises a device support (1), a glue release mechanism (2), an extrusion mechanism (3), a graphite mechanism (4), a glue collection mechanism (5), a circulation mechanism, a adhesion mechanism and a support mechanism. The front end of the device support is provided with a glue releasing mechanism. The device support is connected with a pressing mechanism and a graphite mechanism. The extrusion mechanism is located at the upper end of the graphite mechanism. A glue collecting mechanism is connected to the rear side of the device support. Multiple circulation mechanisms are connected to the device support. A support mechanism is connected to the device support. The lower end of the support mechanism is in contact with the upper end of the adhesive release mechanism extending from the adhesive tape. USE - Used as a graphene material preparation system. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing graphene using a graphene material preparation system. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the graphene material preparation system. Device support (1) Glue release mechanism (2) Extrusion mechanism (3) Graphite mechanism (4) Glue collection mechanism (5)