• 专利标题:   Reducing and graphene molecular imprinted composite material for electrode, comprises molecular imprinting, acetonitrile, methacrylic acid, ethylene glycol dimethacrylate, reducing oxidation graphene, and azobisisobutyronitrile.
  • 专利号:   CN114487051-A
  • 发明人:   TAO L, SHEN F, WEI X
  • 专利权人:   HENGHE MATERIALS TECHNOLOGY CO LTD, NINGBO POLYTECHNIC
  • 国际专利分类:   C01B032/19, G01N027/30
  • 专利详细信息:   CN114487051-A 13 May 2022 G01N-027/30 202268 Chinese
  • 申请详细信息:   CN114487051-A CN11587442 23 Dec 2021
  • 优先权号:   CN11587442

▎ 摘  要

NOVELTY - Reducing and graphene molecular imprinted composite material comprises 3-5 pts. wt. molecular imprinting, 95-100 pts. wt. acetonitrile, 1-2 pts. wt. methacrylic acid, 8-10 pts. wt. ethylene glycol dimethacrylate, 18-23 pts. wt. reducing oxidation graphene 0.5-1.5 pts. wt. azobisisobutyronitrile. USE - Reducing and graphene molecular imprinted composite material for the electrode. ADVANTAGE - The material has excellent reproducibility and good stability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for method for preparing the reducing and graphene molecular imprinted composite material for electrode, which involves preparing the molecularly imprinted material, acetonitrile, methacrylic acid, reducing oxidation graphene mixing and ultrasonic, then adding ethylene glycol dimethacrylate, azobisisobutyronitrile in nitrogen to constant temperature water bath aggregate obtain the semifinished product, and centrifuging the semi-finished product at high speed, adding the eluent, then soaking in acetonitrile, and then centrifuging at high speed, finally obtaining the reduced oxidized graphene oxidized molecular imprinted composite material in vacuum dry.