▎ 摘　　要

NOVELTY - The method involves arranging a transitional metal substrate in a vacuum reaction furnace. The hydrogen gas is poured to the vacuum cavity, while removing the oxygen gas in the vacuum cavity and heated up to 800-1100 degrees C. The carbon gas is poured to the vacuum cavity and the flow rate of the hydrogen gas is maintained. A metal substrate deposited with a graphene is obtained after 1-100 minutes. The air pressure of the tube furnace or atmosphere furnace is pumped to the limit vacuum state. USE - Method for preparing single-layer and multi-layer graphene from chemical gas phase deposition. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the reaction device. (Drawing includes non-English language text)