▎ 摘　　要

NOVELTY - The method involves forming an atom bilayer tape comprising a first monolayer and a second monolayer on a surface of the first monolayer. Forming the atomic bilayer tape comprises exposing two or more precursor powders (12,13) to a humidified gas stream at a temperature sufficient to deposit the atom bilayer tape on a substrate (17) by chemical vapor deposition. The first monolayer and the second monolayer each comprise a transition metal dichalcogenide material. The portion of the first monolayer is oxidized to provide an oxidized portion. The oxidized portion is removed to provide an atomic layer nanotape comprising the transition metal dichalcogenide material. The precursor powders comprise a metal oxide powder and a chalcogen powder. The metal oxide powder comprises molybdenum dioxide and the chalcogen powder comprises sulfur. The metal powder comprises nickel, iron or a combination of nickel and iron. USE - Method for production of atomic bilayer nanotape (claimed) of graphene and transition metal dichalcogenides (TMD) material. ADVANTAGE - The efforts are made to ensure the accuracy of the numbers used, but allow for some experimental errors and discrepancies. The second moisture trap is configured to reduce or remove contaminant moisture from a second inert gas stream. The first moisture trap is configured to reduce or remove contaminant moisture from the first inert gas stream. The synthetic and fabrication approaches to provide atomically thin TMD tapes and nanoribbons are highly achieved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an atomic bilayer tape. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the CVD growth in the method. Inert gas stream (11) Precursor powder (12,13) Tray (15) Bowl (16) Substrate (17) Heating wire (19a,19b)