• 专利标题:   Scale preparation device of chemical vapor deposition (CVD) deposited graphene comprises outlet end of main chamber connected to inlet end of secondary chamber, bottom of preparation chamber sunken downwards to form liquid airtight tank.
  • 专利号:   CN112723347-A, CN214611555-U
  • 发明人:   SUN H
  • 专利权人:   SUN H
  • 国际专利分类:   C01B032/184, C01B032/186
  • 专利详细信息:   CN112723347-A 30 Apr 2021 C01B-032/184 202145 Pages: 22 Chinese
  • 申请详细信息:   CN112723347-A CN10121682 28 Jan 2021
  • 优先权号:   CN10121682, CN20243857

▎ 摘  要

NOVELTY - Scale preparation device of CVD deposited graphene comprises a preparation chamber, which is a sealed chamber. The preparation chamber comprises a main chamber and a secondary chamber. The outlet end of the main chamber is connected to the inlet end of the secondary chamber. The bottom of the preparation chamber is sunken downwards to form liquid airtight tank and the outlet end of the main chamber and the inlet end of the secondary chamber are located below the liquid level of the liquid-tight tank. The conveying belt assembly is arranged in the preparation chamber, after liquid through the airtight tank, extending to the outer side of the preparation chamber through the outlet end of the secondary chamber. The reaction chamber and the cooling chamber are orderly arranged in preparation chamber. The opening end of the reaction chamber and the cooling chamber are set towards the conveying belt assembly. USE - Used as scale preparation device of CVD deposited graphene. ADVANTAGE - The device: adopts the conveyor belt assembly, which drive the substrate to pass through the reaction chamber and the cooling chamber in turn, realizing the continuous output of the substrate relative to the reaction chamber, thus realizing the continuity and integrity of graphene production and the large-scale production of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the scale preparation device of CVD deposited graphene