• 专利标题:   Producing pellicle, useful for extreme ultraviolet lithography, involves e.g. forming primary capping layer on one surface of substrate, forming bonding layer comprising amine group on primary capping layer, and forming core layer.
  • 专利号:   KR2022046216-A, KR2514745-B1
  • 发明人:   YU L, CHO S J, KIM K S, SEO K, MOON S Y, KIM J K
  • 专利权人:   FINE SEMITECH CORP
  • 国际专利分类:   G03F001/22, G03F001/62
  • 专利详细信息:   KR2022046216-A 14 Apr 2022 G03F-001/62 202235 Pages: 9
  • 申请详细信息:   KR2022046216-A KR129372 07 Oct 2020
  • 优先权号:   KR129372

▎ 摘  要

NOVELTY - Producing pellicle, involves (a) forming a primary capping layer on one surface of the substrate, (b) forming a bonding layer comprising an amine group on the primary capping layer, (c) forming a core layer on the bonding layer comprising the amine group, and (d) forming a secondary capping layer over the core layer. The core layer is a carbon layer including a graphene layer, a carbon nanotube layer, and a graphene nanoplate layer. The bonding layer comprising amine group includes polyethyleneimine, polyallylamine hydrochloride or polyaniline. USE - The method is useful in producing pellicle for extreme ultraviolet lithography (claimed). ADVANTAGE - The method provides pellicle has improved bonding strength between capping layer and core layer. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for pellicle comprising a primary capping formed on one surface of the substrate, a bonding layer comprising an amine group formed on the primary capping layer, a core layer formed on the bonding layer comprising amine group, a secondary capping layer formed over the core layer. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a method for producing pellicle (Drawing includes non-English language text).